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  5. Electrical properties of thin RF sputtered Ta2O5 films after constant current stress
Details

Electrical properties of thin RF sputtered Ta2O5 films after constant current stress

Journal
Microelectronics Reliability
Date Issued
2003-02
Author(s)
Pecovska-Gjorgjevich, M.
Novkovski, N.
Atanassova, E.
DOI
https://doi.org/10.1016/S0026-2714(02)00326-8

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