Stress induced degradation in RF deposited Ta/sub 2/O/sub 5/ films on silicon
Journal
2000 22nd International Conference on Microelectronics. Proceedings (Cat. No.00TH8400)
Date Issued
2002
Author(s)
Novkovski, N.
Pecovska-Gjorgjevich, M.
Atanassova, E.
Dimitrova, T.
DOI
DOI:10.1109/ICMEL.2000.840593
