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  5. Stress Degradation of Low Field Leakage in Alumina Gate MOS Structures Containing RF Magnetron Sputtered Thin Ta2O5 Films on Silicon
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Stress Degradation of Low Field Leakage in Alumina Gate MOS Structures Containing RF Magnetron Sputtered Thin Ta2O5 Films on Silicon

Journal
physica status solidi (a)
Date Issued
1999-04
Author(s)
Novkovski, N.
Pecovska-Gjorgjevich, M.
Atanassova, Elena
Dimitrova, T.
DOI
https://doi.org/10.1002/(SICI)1521-396X(199904)172:2<R9::AID-PSSA99999>3.0.CO;2-T

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