Stress-induced leakage currents in thin silicon dioxide films

Journal

Journal of Materials Science: Materials in Electronics

Date Issued

2003-10

Author(s)

Pesic, B.

Vracar, L. J.

Stojadinovic, N.

Pecovska-Djordjevic, M.

Novkovski, N.

DOI

https://doi.org/10.1023/A:1026169624327