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  5. Stress induced degradation in RF deposited Ta/sub 2/O/sub 5/ films on silicon
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Stress induced degradation in RF deposited Ta/sub 2/O/sub 5/ films on silicon

Journal
2000 22nd International Conference on Microelectronics. Proceedings (Cat. No.00TH8400)
Date Issued
2000
Author(s)
Novkovski, N.
Pecovska-Gjorgjevich, M.
Atanassova, E.
Dimitrova, T.
DOI
DOI: 10.1109/ICMEL.2000.840593

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