Institute for Physics

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Author: search.filters.author.Novakovic, MirjanaLanguage: search.filters.language.English

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    Item type:Publication,
    Formation of WO3 thin films from RF sputtered tungsten films by air annealing: A cost-effective approach
    (National Library of Serbia, 2025)
    Jovanovski, Stefan
    ;
    Popovic, Maja
    ;
    Novakovic, Mirjana
    ;
    Rajic, Vladimir
    ;
    WO3 thin films were prepared by RF sputtering metallic tungsten onto glass substrates, followed by thermal oxidation through annealing in air. This technique is straightforward, cost-efficient, and time-effective, achieving high deposition rates of 16 nm/min on average at 200 W magnetron power for the highly homogeneous W-metallic films. SEM/EDX analysis showed that after annealing at 450ᵒC in air, the RF sputtered 269 nm thick metallic W films with a round grain morphology (~30 nm) turned into 420 nm thick nearly stoichiometric transparent WO3 (tungsten (VI) oxide) film, with a dramatically changed morphology of aggregated crystal rods approximately 1 μm long. XRD and Raman spectroscopy confirmed a biphasic crystal structure, with a dominant monoclinic phase and a minor tetragonal phase. XPS analysis revealed the characteristic W4f7/2 and W4f5/2 electron peaks associated with the W6+ oxidation state, with no evidence of W5+ species, indicating a stoichiometric nature of the WO3 films.