Please use this identifier to cite or link to this item:
http://hdl.handle.net/20.500.12188/11358| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | I. Grozdanov, | en_US |
| dc.date.accessioned | 2021-03-24T08:13:24Z | - |
| dc.date.available | 2021-03-24T08:13:24Z | - |
| dc.date.issued | 1994 | - |
| dc.identifier.uri | http://hdl.handle.net/20.500.12188/11358 | - |
| dc.language.iso | en_US | en_US |
| dc.relation.ispartof | Materials Letters, 19, 281–285 (1994). | en_US |
| dc.title | Electroless chemical deposition technique for Cu2O thin films | en_US |
| dc.type | Journal Article | en_US |
| item.grantfulltext | open | - |
| item.fulltext | With Fulltext | - |
| Appears in Collections: | Faculty of Natural Sciences and Mathematics: Journal Articles | |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| XIII_0575.pdf | I. Grozdanov, Electroless chemical deposition technique for Cu2O thin films, Materials Letters, 19, 281–285 (1994). | 342.77 kB | Adobe PDF | View/Open |
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