Please use this identifier to cite or link to this item: http://hdl.handle.net/20.500.12188/10931
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dc.contributor.authorG. Mavrodiev, A. Georgievski, M. Gajdardžiska-Josifovska, V. Jordanovska,en_US
dc.date.accessioned2021-03-16T08:55:04Z-
dc.date.available2021-03-16T08:55:04Z-
dc.date.issued1987-
dc.identifier.urihttp://hdl.handle.net/20.500.12188/10931-
dc.language.isoen_USen_US
dc.relation.ispartofAnnuaire − Physique, 37, 15– 22 (1987).en_US
dc.titleThe thickness of SnO2:F films as principal factor of their propertiesen_US
dc.typeJournal Articleen_US
item.grantfulltextopen-
item.fulltextWith Fulltext-
Appears in Collections:Faculty of Natural Sciences and Mathematics: Journal Articles
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