Browsing by Author Novkovski, N.
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| Preview | Title | Author(s) | Issue Date | Type |
|---|---|---|---|---|
| Reduction of Interface States Stress Generation by Oxygen Annealing of ALD Nanolaminated HfO2/Al2O3 Dielectric Stacks for Charge Trapping Devices | Skeparovski, A.; Novkovski, N.; Paskaleva, A.; Spassov, D. | 12-Sep-2021 | Proceeding article |